JACoW is a publisher in Geneva, Switzerland that publishes the proceedings of accelerator conferences held around the world by an international collaboration of editors.
@inproceedings{benjamin:srf2023-mopmb011,
author = {C. Benjamin and G. Burt and J.A. Conlon and N.L. Leicester and O.B. Malyshev and H.S. Marks and D.J. Seal and L.G.P. Smith and R. Valizadeh},
% author = {C. Benjamin and G. Burt and J.A. Conlon and N.L. Leicester and O.B. Malyshev and H.S. Marks and others},
% author = {C. Benjamin and others},
title = {{Deposition and Characterisation of V₃Si films for SRF Applications}},
% booktitle = {Proc. SRF'23},
booktitle = {Proc. 21th Int. Conf. RF Supercond. (SRF'23)},
pages = {84--87},
eid = {MOPMB011},
language = {english},
keywords = {cavity, SRF, site, target, vacuum},
venue = {Grand Rapids, MI, USA},
series = {International Conference on RF Superconductivity},
number = {21},
publisher = {JACoW Publishing, Geneva, Switzerland},
month = {09},
year = {2023},
issn = {2673-5504},
isbn = {978-3-95450-234-9},
doi = {10.18429/JACoW-SRF2023-MOPMB011},
url = {https://jacow.org/srf2023/papers/mopmb011.pdf},
abstract = {{A15 superconducting materials, like V₃Si and Nb₃Sn, are potential alternatives to Nb for next generation thin film SRF cavities when operated at 4 K. Their relatively high Tc and superconducting properties could allow for higher accelerating gradients and elevated operating temperatures. We present work on the deposition of V₃Si thin films on planar Cu substrates and an open structure 6 GHz cavity, using physical vapour deposition (PVD) and a V₃Si single target. The surface structure, composition and DC superconducting properties of two planar samples were characterised via secondary electron microscopy (SEM), energy dispersive x-ray spectroscopy (EDX) and in a magnetic field penetration facility. Furthermore, the first deposition using PVD of a V₃Si film on a 6 GHz split cavity and the RF performance is presented.}},
}