Author: Howes, W.I.
Paper Title Page
MOPMB015 Development of a Plasma-Enhanced Chemical Vapor Deposition System for High-Performance SRF Cavities 100
SUSPB009   use link to see paper's listing under its alternate paper code  
 
  • G. Gaitan, A.T. Holic, W.I. Howes, G. Kulina, P. Quigley, J. Sears, Z. Sun
    Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
  • M. Liepe
    Cornell University, Ithaca, New York, USA
  • B.W. Wendland
    University of Minnesota, Minnesota, USA
 
  Funding: This work was supported by the U.S. National Science Foundation under Award PHY-1549132, the Center for Bright Beams
Next-generation, thin-film surfaces employing Nb₃Sn, NbN, NbTiN, or other compound superconductors are essential for reaching enhanced RF performance levels in SRF cavities. However, optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University is developing a plasma-enhanced chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a high-vacuum, gas, and precursor delivery system, and uses plasma to significantly reduce the required processing temperature and promote precursor decomposition. Here we present an update on the development of this system, including final system design, safety considerations, assembly, and commissioning.
 
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DOI • reference for this paper ※ doi:10.18429/JACoW-SRF2023-MOPMB015  
About • Received ※ 16 June 2023 — Revised ※ 29 June 2023 — Accepted ※ 01 July 2023 — Issue date ※ 16 July 2023
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