Cornell University (CLASSE), Cornell Laboratory for Accelerator-Based Sciences and Education, Ithaca, New York, USA
Cornell University, Ithaca, New York, USA
University of Minnesota, Minnesota, USA
Next-generation, thin-film surfaces employing Nb₃Sn, NbN, NbTiN, or other compound superconductors are essential for reaching enhanced RF performance levels in SRF cavities. However, optimized, advanced deposition processes are required to enable high-quality films of such materials on large and complex-shaped cavities. For this purpose, Cornell University is developing a plasma-enhanced chemical vapor deposition (CVD) system that facilitates coating on complicated geometries with a high deposition rate. This system is based on a high-temperature tube furnace with a high-vacuum, gas, and precursor delivery system, and uses plasma to significantly reduce the required processing temperature and promote precursor decomposition. Here we present an update on the development of this system, including final system design, safety considerations, assembly, and commissioning.
