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- Y. Kalboussi, C.Z. Antoine, M. Baudrier, Q. Bertrand, C. Boulch, B. Delatte, G. Jullien, L. Maurice, Th. Proslier, P. Sahuquet, T.V. Vacher
CEA-IRFU, Gif-sur-Yvette, France
- M. Asaduzzaman, T. Junginger
UVIC, Victoria, Canada
- M. Asaduzzaman
TRIUMF, Vancouver, Canada
- D. Dragoe
ICMMO, Orsay, France
- F. Éozénou
CEA-DRF-IRFU, France
- N. Lochet
CEA, DES, Université Paris-Saclay, Gif-sur-Yvette, France
- D. Longuevergne, T. Pépin-Donat
Université Paris-Saclay, CNRS/IN2P3, IJCLab, Orsay, France
- F. Miserque
CEA, LECA, Université Paris-Saclay, Gif-sur-Yvette, France
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Atomic Layer Deposition is a synthesis method that enable a unique control of thin films chemical composition and thickness over complex shape objects such as SRF cavities. This level of control opens the way to new surface treatments and to study their effect on RF cavity performances. We will present coupon and, in some cases, preliminary cavity results, from various surface engineering routes based on the deposition of thin oxides and nitrides films combined with post annealing treatments and study their interactions with the niobium. Three main research directions will be presented: 1/ replacing the niobium oxides by other surface layers (Al₂O₃, Y2O3, MgO) and probe their effect on the low and high field performances, 2/ doping with N and combine approaches 1/ and 2/ and finally 3/ optimize the superconducting properties of NbTiN multilayers on Nb and Sapphire.
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